Hitachi IM4000 ion milling system
Flat milling of surfaces for SEM and cross sectional milling using argon ions
Location: Jesser Hall room 131
The Hitachi IM4000 system is used as the final preparation step to obtain flat samples for SEM and for hardness testing. The IM4000 also allows preparation of large cross sections of samples by using specimen masks.
IM4000 Technique Summary:
Up to 6 kV argon ion energy
Sample size up to 25mm x 50 mm
- Stage movement op up 7 mm
Stage rotation during milling as well as tilting
Cross sectioning using a mask
Maximum milling rate of 20 micron per hour for spot milling of Si
Maximum milling rate of 2 micron per hour for flat milling of Si an an ara of 5 mm diameter
Maximum milling rate of 300 micron per hour for cross sections in Si
Training Videos for IM4000:
Training videos (.mp4 format) for the IM4000 ion mill are available and should be reviewed prior to instrument training. The standard UVa password is required to access videos.
Manuals and other information about this ion mill can be found in the IM4000 folder on UVa's Sharepoint.