FEI Talos F200X G2 Transmission Electron Microscope (S)TEM
Atomic-Scale Imaging and Nanoscale Compositional Analysis for Materials
About
Location: Jesser Hall room 158
The FEI Talos system allows for imaging of materials with atomic resolution in both the Transmission Electron Microscopy (TEM) and the Scanning TEM (STEM) modes. Compositional analysis is available using the Super-X EDS System (Energy Dispersive X-Ray Spectroscopy).
TEM Technique Summary:
- Atomic resolution imaging of crystal lattices in TEM and STEM modes
- Imaging of defects, precipitates and interfaces using bright- and dark-field techniques
- Elemental Composition for Z>5
- Elemental Sensitivity: < 1 wt.% with spatial resolution in the 10 nm range
- Electron diffraction for structural analysis of areas with diameters > 150 nm
- Cryo- and heating options for samples
- Samples can be powders or materials thinned to less than 1 micron in thickness
- Maximum sample diameter: 3 mm, maximum height: 0.25 mm
STEM/TEM Features:
- 200kV
- STEM and TEM system with Field Emission Gun
- Resolution: STEM: 0.16 nm; TEM: 0.10 nm
- Super-X EDS with 4 SDD symmetric design, windowless, shutter-protected for energy dispersive X-ray analysis
- Low-background Double-Tilt Specimen Holder, alpha tilt angles up to 40°
- Cold Stage (liquid nitrogen) and Heating Stage (up to 850°C) Double-Tilt Specimen Holders
- Titan Smart Tilt
- Gatan Oneview camera: 4096x4096 pixels with 25.1 fps
- HAADF, Bright Field, and Dark Field STEM detectors
- Talos Compucentricity
- Talos Free Lens Control Operating range: 0.5 to 30 kV in 0.1 kV steps
Contact Us
Helge Heinrich
Research Scientist, Materials Science & Engineering
Principal Scientist for HR-S/TEM & FIB-SEM
Dr. Helge Heinrich joined the NMCF as the Principal Scientist for High-resolution Transmission Electron Microscopy, with expertise in focused ion beam sample preparation and cross sectional electron microscopy (FIB-SEM) from the University of Central Florida.