Nanoscale Materials Characterization Facility
Instrumentation
Electron Microscopy for High Resolution Imaging
Macro through Atomic-Scale Imaging, Phase and Compositional Analysis
X-ray Instrumentation for Materials Characterization
Determination of bulk and surface elemental composition, chemistry and phase
Light Spectroscopy & Microscopy
Surface topography, roughness, and porosity analysis; 2-D/3-D videography and imaging; sample preparation/testing equipment
Sample Preparation and Testing Instrumentation
Sample preparation/testing equipment
State-of-the-art materials characterization.....
The Nanoscale Materials Characterization Facility (NMCF) staff provide analytical services and solutions to academia and industry by characterizing materials of all types. Analysis of structure, composition, and defects utilizing X-ray diffraction, X-ray photoelectron spectroscopy, optical imaging, atomic force microscopy, FT-IR & Raman spectroscopies, and electron microscopies (SEM & HR-S/TEM) which may be combined with elemental analysis.
More About Us
-
Facility Instrumentation Tour
Process solutions, defect analysis, and materials characterization solutions for academia and industry. Introduction to the Nanoscale Materials Characterization Facility instruments and capabilities.
-
Deciding on the right analytical technique
Need assistance selecting the appropriate materials characterization method?
-
NMCF Recent Publications
“Robust Antiferroelectric Response in the Pbca Phase of Hafnium Zirconium Oxide via Aluminum Substitution,” Y. K. Choi, M. Kang, T. Alem, N. K. Lam, A. L. Watson, K. Burns, S. J. McDonnell, L. Zhou and J. F. Ihlefeld, Journal of the American Ceramic Society 109 (9) (2026). https://doi.org/10.1111/jace.71191 - Bruker FTIR, SmartLab XRD, & Empyrean XRD
“Enhanced Ferroelectric Phase Formation via Local Structure Modification in the Pre‐Crystalline State of Hafnium Zirconium Oxide Thin Films,” N. K. Lam, G. R. Bejger, W. A. Wani, K. M. Holsgrove, A. N. Titus, N. Sharma, S. Wang, K. Orson, M. K. Lenox, L. Shvilberg, Y. K. Choi, I. A. Brummel, B. L. Aronson, P. Reinke, Q. Ramasse, A. Kumar, B. J. Rodriguez, C. M. Rost and J. F. Ihlefeld, Advanced Functional Materials (2026). https://doi.org/10.1002/adfm.78109 - Bruker FTIR & SmartLab XRD
“Correlating biaxial stress to metastable phases in Hf0.5Zr0.5O2 on substrates with different coefficients of thermal expansion,” N. T. Qureshi, M. Ferasat, L. Johnson, B. L. Aronson, Y. K. Choi, N. K. Lam, M. K. Lenox, J. A. Hachtel, N. Shukla, T. E. Beechem, K. Burns and J. F. Ihlefeld, Applied Physics Letters 129 (14), 142901 (2026). https://doi.org/10.1063/5.0354327 - Bruker FTIR, SmartLab XRD, Themis HR-S/TEM & Helios FIB
"Laser removal of silicon solar cell backsheet while preserving tempered glass and silicon wafer." Khetri, M., Kanaujia, P. K., & Gupta, M. C. (2026). Solar Energy Materials and Solar Cells, 304, 114404. https://www.sciencedirect.com/science/article/abs/pii/S092702482600245X - FEI Quanta 650 SEM/EDS & Renishaw Raman
"Superhydrophilic and superhydrophobic surfaces with reversible wettability using laser processing." Chakraborty, A., Khetri, M., Surampudi, A., & Gupta, M. C. (2026). ACS Omega, 11(19), 27970–27984. https://pubs.acs.org/acsodf/article/11/19/27970/5072114/Superhydrophilic-and-Superhydrophobic-Surfaces - FEI Quanta 650 SEM/EDS & Renishaw Raman
NMCF Location.....
The NMCF is located within UVA's Materials Science and Engineering (MSE) Department in Wilsdorf & Jesser Halls. Instrumentation for materials characterization is available for use by qualified faculty and students at UVA, as well as by researchers from industry and academic / government institutions.
Statistics
>275 Current NMCF Users
4 NMCF Staff Members
400+ Publications
18 Major Analytical Instruments
Questions? Comments?
Arthur W. Lichtenberger
Dr. Lichtenberger is a Research Professor at UVA and the NRAO Director of the UVA Microfabrication Laboratories. He has built an internationally recognized research program in superconducting materials, devices, circuits and packaging for ultra-sensitive single pixel and and array THz detectors.